Smallscale Atomic Layer Deposition (ALD) System
Key Freature:
Small scale ALD system with cutting edge preformamce
Chamber designed and optimized for typical R&D substrates
Large substrate and precursor temperature ranges
Up to five ALD precursor sources at one time
System is completely metal sealed upstream of sample
Fast cycling capability
High aspect ratio deposition with excellent conformality
Precise precursor dosing with defined dose volumes
Simple system maintenance and safety interlocks
Smallest footprint on market, cleanroom compatible
User defined sample fixturing available

If you have any questions, please feel free and contact Mr. Hong
E-mail:  Tel:03-5526201#806