Plasma Enhanced Chemical Vapor Deposition System(PP1000 PECVD)

Large Batch PECVD system - PlasmaPro 1000 Stratum

The PlasmaPro 1000 Stratum PECVD tool provides outstanding benefits for LED manufacturers

Our large batch PECVD tool has been specifically developed for passivation deposition in LED production

  • Designed for the deposition of SiO2 and SiNx layers
  • Its large area electrode and optimised showerhead design allows up to:
    • 61 x 2”
    • 15 x 4”
    • 7 x 6” wafers in a single load
  • High quality device performance and yield
  • Reliable hardware and ease of serviceability for excellent uptime

    System features of the PlasmaPro 1000 Stratum PECVD tool

  • The PlasmaPro 1000 Stratum provides outstanding benefits for LED manufacturers
  • 490mm electrode giving unparalleled throughput from industry leading batch sizes of up to 7 x 6” wafers
  • High quality device performance and yield
  • Reliable hardware and ease of serviceability for excellent uptime
  • Low cost of ownership
  • Optimised for batch production, the PlasmaPro 1000 Stratum has a vacuum load lock as standard, with open load and cluster capability options
  • System designed to minimise cleaning overhead
  • Batch Sizes

    Wafer Size Number of Wafers
    150mm/6" 7
    100mm/4" 15
    50mm/2" 61

    Plasma Enhanced Chemical Vapour Deposition (PECVD) of the following materials
    can be achieved using the PlasmaPro 1000 Stratum PECVD tool:

  • Dielectrics
  • Metal Nitrides
  • Metal Oxides