Inductively Coupled Plasma Etcher System (PP100 Polaris single wafer type)

An evolution in single wafer etch technology - PlasmaPro 100 Polaris

With extensive experience of etching all HBLED related materials, our technologies enable the cost of ownership and yield required to maximise the performance of your devices.

The PlasmaPro 100 Polaris single wafer etch system offers smart solutions to produce the superb etch results you need to maintain your competitive edge.

  • Designed specifically for the harsh chemistries required for etching tough materials such as Sapphire, GaN and SiC
  • Fast etch rates uniformly on wafers up to 200mm diameter
  • Developed with reliability, uptime and ease of serviceability in mind
  • Low cost of ownership
  • Clusterable with other PlasmaPro systems
  • Exclusive Electrostatic Clamp technology capable of clamping sapphire, GaN on sapphire and silicon
    Key system features and benefits include:
  • Actively cooled electrode to maintain sample temperature during etch process
  • High power ICP source producing high density plasmas
  • Magnetic spacer for enhanced ion control and uniformity
  • High conductance pumping system
  • Reliable hardware and ease of serviceability for excellent uptime